Multi-Temperature Zone Substrate holder

The patented MTZ-Block allows multiple partial wafers to be grown at separate temperatures simultaneously. Speed up your temperature dependent research and temperature calibrations while increasing the throughput of your deposition system. The MTZ-Block is available for ultra-high vacuum deposition systems and installs into your 2-3” substrate holder with no system modifications required. Options available for common partial substrate shapes and sizes, contact us for more information. U.S. Patent No. US10290524B2

 

3in MTz-Block example with (4) 1 cm square sample size

Features & Benefits Include:

  • Adjustable temperature zones for each wafer resulting in a consistent temperature differential between multiple samples grown simultaneously.

  • Reduce the duration and expense of your growth campaigns while reducing unwanted variables (deposition rates, pressures, ect.) between samples to increase the efficiency and quality of your temperature dependent research.

  • Great for temperature calibrations, multiple growths at separate temperatures, or without heat shielding for multiple samples at identical temperatures.

  • No system modifications necessary. Installs like a typical 2-3” wafer and works with your existing substrate heater, manipulator, thermocouple, and power supply.

  • Support for all common wafer sizes, shapes, applications, and deposition systems with a 2" wafer capacity or greater.