Our Patented Multi-Temperature Substrate Holder (MTZ-Block) is engineered to enable multiple simultaneous epitaxial growths at independently controlled substrate temperatures within the same deposition run. By enabling uniform flux conditions across multiple substrates at various temperatures, the MTZ-Block dramatically boosts efficiency, reproducibility, and overall quality of your materials science research. Eliminate run‐to‐run variability and more accurately determine how substrate temperature alone affects film morphology, composition, crystal structure, and electronic properties during deposition.

The MTZ-Block is specifically designed for use with continuous azimuth substrate rotation and manipulators commonly used in molecular beam epitaxy deposition systems. The simple compact design installs into any MBE deposition system just like a standard 2-3” substrate. No modifications to your existing deposition system, substrate holder or control electronics are necessary.

Achieve significant reductions in the time and expense required to conduct your research while improving overall quality, reliability and accuracy of your results with our patented Multi-Temperature Substrate Holder.

Contact us today to discuss your application and receive additional information.

 

Key Features & Benefits:

  • Independently adjustable temperature zones resulting in a consistent temperature differential between multiple samples grown simultaneously.

  • Each temperature zone is independently calibrated to the existing thermocouple controlling the substrate heater.

  • Each temperature zone can be modified between runs to adjust the temperature of each zone and modify temperature differential across multiple substrates at various temperature ranges.

  • Options available for common substrate sizes.

  • Significantly improve the speed at which you conduct temperature dependent research, temperature calibrations and overall process efficiency.

  • Reduce the duration and expense of your growth campaigns while reducing unwanted variables deposition rates, pressures,.) between samples to increase the efficiency and quality of your temperature dependent research.

  • No system modifications necessary. Installs like a typical 2-3” wafer and works with your existing substrate heater, manipulator, thermocouple, and power supply.

  • Support for all common wafer sizes, shapes, applications, and deposition systems with a 2" wafer capacity or greater.